Unit 2 Gable Business Park, 10 Derrick Drive, Somerset West, 7130

X-Sight Technology

Industrial CT / Inspection Technologies

Technology

Industrial CT and X-ray Patented Technology

Our systems are packed with pioneering technology unique to us.

From our Integral Generators to the world’s only 750kV Microfocus x-ray source, Nikon Metrology X-ray products offers the broadest range of the most technologically advanced x-ray solutions to all industry challenges from microchips to archaeology.

Integral Generator

Patented Technology

Patented Technology

Nikon Metrology’s patented range of Integral Generators offer bullet-proof reliability and fast, precise control of x-ray parameters. The technology means that the x-ray source can be manoeuvred with respect to the sample, giving unrivalled viewing angles, and reducing cabinet weight and footprint.

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Rotating Anode

World’s first microfocal rotating anode

World’s first microfocal rotating anode

Nikon Metrology offers the world’s only microfocal rotating target. This unique design allows up to 5 times more x-ray flux, giving excellent signal to noise ratio and increasing CT inspection throughput.

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320kV Active Module

320kV Active Module

320kV Active Module

Nikon Metrology’s active 320kV module can be interchanged with one of the passive x-ray targets to increase x-ray penetration up to 320kV at high x-ray flux. It is ideal for the penetration of denser samples such as castings, rock cores and fossils.

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450kV Active Module

450kV Active Module

450kV Active Module

Nikon Metrology’s 450kV module can be interchanged with one of the passive x-ray targets to increase x-ray penetration up to 450kV at high x-ray flux. This is ideal for turbine blade and weld inspection especially when used with a line array detector.

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750kV Microfocal Source

750kV Microfocal Source

750kV Microfocal Source

Nikon Metrology offers the world’s first and only 750kV Microfocal x-ray source.  This unique high power source allows penetration of very dense samples whilst maintaining microfocal resolution.

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Ultrafocus Target

High Power Ultrafocus Target

High Power Ultrafocus Target

The Nikon Metrology high power Ultrafocus target offers high x-ray flux for good signal to noise and is the only reflection target of its kind offering multiple target materials selectable without breaking vacuum. Target material can be selected to give optimised imaging depending on the sample.

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Nanotech Target

Nanotech Target

Nanotech Target

Nikon Metrology’s range of Nanotech targets offers unrivalled resolution down to 100 nanometres without compromising x-ray flux, and allows high geometric magnification. Nanotech targets are readily interchangeable with the Ultrafocus targets when very high resolution is required.

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Open Source Technology

unique open source design

unique open source design

Nikon Metrology’s unique open source design reduces the long-term cost of ownership, enabling customers to maintain their x-ray sources themselves using cost-effective, readily available consumables. This makes the lifetime of the source effectively unlimited. In addition, this open source design allows different x-ray targets to be interchanged on the same x-ray source. This means customers are able to migrate from microfocal to nanofocal resolution by simply changing the x-ray target, without the need for a new system or cabinet. In this way Nikon Metrology can offer a complete x-ray laboratory within one system cabinet.

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