Unit 2 Gable Business Park, 10 Derrick Drive, Somerset West, 7130
XT H 320 thumb
XT H 320 thumb
XT H 320 thumb

XT H 320 for X-ray and CT inspection of larger samples

XT H 320 for X-ray and CT inspection of larger samples

The XT H 320 features a more powerful microfocus X-ray source that is able to run highly accurate inspection on dense industrial objects. Nikon Metrology is the only company to produce 320kV microfocus X-ray sources. As the X-ray spot size of these sources is orders of magnitude smaller compared to minifocus sources, end users benefit from superior resolution, accuracy and a wider array of measurable parts.

With the optional rotation reflection target, an even higher X-ray flux is available enabling customers to obtain faster CT data acquisition or achieve higher CT data accuracy in the same time span.

Categories: Computed Tomography

Applications: Metal corrosion mechanisms, Unveiling mysteries of nature, Implant research, Aircraft Component Inspection, Composites, Automotive Components Inspection, Rocks/Minerals, Plastic Manufacturing, Metallurgy, Implants/ Protheses, Streamlining vehicle pre-production, Household appliances and white goods , Metal Manufacturing, Cosmetics, Die and Mould Applications, Automated measurement, Critical assemblies of medical devices or drug delivery systems, Dental applications, Cracks and Failure Analysis, Manual examination, Damage propagation in composite material, Mobile phones, shavers & watches

Key benefits

XT H 320 Key features

XT H 320 LC X-ray source: Superior accuracy and performance through proprietary 225 or 320kV micro-focus X-ray source

The default 225kV microfocus source is equipped with a reflection target, offering a 3 micron spot size. With the optional transmission target, you obtain an even smaller spot size and higher magnification capability.
The 320kV microfocus source is used to penetrate through larger or denser samples.
Regardless of the target of choice, the XT H LC system uses an open-tube X-ray source that guarantees a lower cost-of-ownership.

X-ray source with rotating reflection target: Rotating reflection target multiplies X-ray flux

Traditional X-ray sources using fixed targets can only receive a limited flux of electrons to avoid damaging the target. By introducing a rotating reflection target that yields much better cooling performance, the electron flux on the rotating target radically increases without the risk for permanent damage. This boosts X-ray flux by a large factor, and enables customers to obtain faster CT data acquisition or achieve higher CT data accuracy in the same time span
By establishing up to 5 times more X-ray flux, customers can either speed up data acquisition by a similar factor or increase data accuracy by taking more radiographs in the same time.

Stunning images from internal structures

A small spot size and a high-resolution flat panel create sharp images.  Adapt resolution to your needs: full part in coarse resolution and high resolution in a desired region of interest.

XTH320: Easy access to inspect larger parts

The XT H LC systems feature a large access door and the heavyduty precision 5-axis manipulator can hold samples in excess of 50kg with dimensions of 0.6m (H) x 0.6m (D).

Safety first

Full protective enclosure – compliant to CE and DIN 54113 radiation safety standards – requires no special badges or protective clothing. Continuous fail-to-safe monitoring during system operation. Radiation shielding is to better than 1µSv/hour external, and dual fail-safe switches/relays ensure safe operation.

Configuration of System: Configure the system to your specific needs

Specific applications require more detailed images or higher accuracy. XT H 320 can be configured with different flat panels (Varian, Perkin Elmer) or source configuration (reflection/ transmission target) to make the system ideally suited for your needs.

XT H 320 Specifications

Microfocus source      Max. kVMax. powerFocal spot sizeFocal spot size  at max powerXT H 320
225 kV Reflection target 225 kV 225 W 3 µm up to 7 W 225 µm at 225 W
225 kV Rotating target option 225 kV 450 W 10 µm up to 30 W 113 µm at 450 W
320 kV Reflection target  320 kV 320 W 30 µm up to 30 W  300 µm at 320 W 
Basic configuration
Alternative configuration

 

Detectors            # BitsActive pixelsPixel SizeMax. frame rate at 1x1 binningMax. frame rate at 2x2 binning
Varian 2520 (1) 14-bit 1900 x 1516 127 µm 7.5 fps  15 fps
Perkin Elmer 0820 14-bit 1000 x 1000 200 µm 7.5 fps  15 fps
Perkin Elmer 1620  16-bit 2000 x 2000 200 µm 3.75 fps  7.5 fps
Perkin Elmer 1621 EHS  16-bit 2000 x 2000 200 µm 15 fps 30 fps
Combination
PE162x & CLDA 
Configuration with both Flat panel and
 Curved Linear Diode Array detector

 (1) only with 225 kV source

Manipulator               
# Axes 4 (optional 5th axis)
Axes travel (X) 510 mm
(Y) 610 mm
(Z) 800 mm
(Rotate) n*360
Max. sample weight 100kg

 

General                    
Cabinet dimensions (LxWxH) 2,695 mm x 1,828 mm x 2,249 mm
Weight 8,000 kg
Safety All systems are manufactured to IRR99
Control software  All systems are controlled by Nikon Metrology’s in-house Inspect-X software 

 

 

 

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